What is the Silicon Nitride used for?

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Silicon Nitride.

Si3N4 is an organic compound with the chemical composition silicon nitride. It is a key structural ceramic material, with excellent hardness, durability, wear resistance, atomic clarity, and oxidation resistance at elevated temperatures. The material can also withstand the heat and chill shocks. It can be heated to over 1000 degrees Fahrenheit in the atmosphere and will not crack when rapidly cooled down and then warmed again. The excellent properties of silicon-nitride ceramics is why it's often used in the manufacture of mechanical components, such as bearings. A silicon nitride-ceramics heat-receiving layer for engine components that is resistant to high heat and difficult to transmit heat can help improve the quality of diesel engines as well as save fuel.

For what purpose is Silicon Nitride?

Silicon nitride serves as a high quality refractory. This fine-structure ceramic material is known for its uniformity and mechanical strength. It's also called the SI3N4BN-BN series horizontal continuously casting separation ring. The material meets continuous casting technology requirements and has excellent thermal shock resistance.

Materials made of silicon nitride are extremely stable in temperature, resistant to oxidation, and have high dimensions. Covalent compounds with high bond strength can create an oxide protective shield in the atmosphere. Silicon nitride also exhibits good chemical stability. It doesn't oxidize, so it won't be affected by any molten metals.

These ceramic materials from silicon nitride are suitable for use in high temperature engineering components, advanced and complex refractory materials, chemical industry corrosion-resistant, sealing and cutting components as well.

The strong bonds that silicon nitride makes with aluminum oxide (silicon carbide), silicon carbide, silicon dioxide, thorium dioxide and boron trioxide make it a versatile material.

You can use silicon nitride in solar cells. When the silicon nutride film has been coated with the PECVD procedure, it can serve as an antireflection film that reduces incident light. However, during the process of deposition of silicon nitride, the hydrogen atoms in the reaction product are introduced into silicon wafer and the silicon movie. These acted as passivation defect. However, this atomic relationship of silicon silicon nitride with silicon nitride does not necessarily equal 4:3. However, it can change depending on the process conditions. Also the physical properties that correspond to different atomic relationships are different.

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